納米三坐標(biāo)測(cè)量機(jī)不確定度分析與精度設(shè)計(jì)
楊洪濤[1] 費(fèi)業(yè)泰[2] 陳曉懷[1][1]合肥工業(yè)大學(xué)儀器科學(xué)與光電工程學(xué)院,安徽合肥230009 [2]安徽理工大學(xué)機(jī)械工程系,安徽淮南232001摘 要:利用現(xiàn)代精度設(shè)計(jì)理念設(shè)計(jì)納米三坐標(biāo)測(cè)量機(jī)的結(jié)構(gòu),選用高精度的零部件進(jìn)行組裝,解決了傳統(tǒng)阿貝誤差問題,通過研究現(xiàn)代精度保障理論和技術(shù),進(jìn)行納米級(jí)水平的誤差源全面分析,推導(dǎo)各個(gè)不確定度分量的計(jì)算公式,根據(jù)給定的精度指標(biāo)設(shè)計(jì)合理的精度,提出所需檢定儀器的具體技術(shù)指標(biāo),精度設(shè)計(jì)的結(jié)果滿足了納米三坐標(biāo)測(cè)量機(jī)的測(cè)量精度要求.[著者文摘]
關(guān)鍵詞:納米三坐標(biāo)測(cè)量機(jī) 阿貝誤差全誤差源分析 不確定度 精度設(shè)計(jì)
分類號(hào): TG8 TH7[著者標(biāo)引]文獻(xiàn)標(biāo)識(shí)碼:A文章編號(hào):1000-582X(2006)08-0082-05欄目信息:機(jī)械·光電工程
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Uncertainty Analysis and Accuracy Design of Nano-CMMYANG Hong-tao , FEI Ye-tai , CHEN Xiao-huai 1. School of Instrument Science and Opto-electronic Engineering Hefei University of Technology, Hefei 230007, China; 2. Department of Mechanical Enginneering of Anhui University of Science & Technology, Huainan 232001, ChinaAbstract:By using advanced accuracy design concept, Nano-CMM's structure is designed, which is set-up by choosing high degree of accuracy components. The traditional Abbe error is solved due to the design of the structure of the Nano- CMM. By studying the modem accuracy ensuring theory and technique, the nanometer level's analysis of total error source of the Nano-CMM is processed. The uncertainty calculating formula is deduced. The reasonable error distributing and design are clone according to the given accuracy target. The needed nanometer level calibrating instruments'technic index are put forward. The result of accuracy design meets the measuring accuracy demand of Nano-CMM is made.[著者文摘]
Key words:Nano-CMM ; Abbe error; analysis of total error source ; uncertainty accuracy design |
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